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Huajinda at RadTech China 2026 | Specialty UV Monomers & Applications

Huajinda at RadTech China 2026

From August 13 to 14, Huajinda participated in RadTech China 2026, the 27th Annual Conference on Radiation Curing, in Nanchang, Jiangxi. We showcased a range of specialty UV monomers and met with customers, technical experts, and industry partners from the coatings, inks, adhesives, and functional materials sectors.

Huajinda also delivered a technical presentation covering the structure, performance testing, and applications of specialty UV monomers.

1. Specialty UV Monomers on Display

At RadTech China 2026, Huajinda presented specialty UV monomers including THFA, CTFA, TMCHA, TBCHA, ITDA and DP(EO)6A, together with our DCPA and TCD product series. These products are designed for a range of UV-curing applications, including coatings, inks, adhesives and other UV-curable materials.

High-purity grades of THFA and CTFA are available. TMCHA and TBCHA are alicyclic monofunctional monomers with different characteristics in viscosity, substrate compatibility and curing performance. Long-chain monomers such as ITDA and DP(EO)6A provide additional options for flexible material systems.

Product selection should ultimately be based on the resin system, substrate and specific formulation requirements, followed by application testing.

2. Structure and Applications of Specialty UV Monomers

During the conference, Chelsey He, Technical Sales Engineer at Huajinda, delivered a presentation titled “Application Study of Rigid Alicyclic and Flexible Long-Chain Acrylate Monomers.”

The presentation focused on two groups of alcohol-based raw materials with different structural characteristics and their derived UV monomers, covering Huajinda’s work in monomer properties, curing behavior, and downstream application testing.

Using rigid alicyclic monomers and long-chain branched alcohol-derived monomers as the two main examples, the presentation compared their physical properties, curing behavior and formulation performance.

The discussion covered differences in hardness, modulus, chemical resistance, low viscosity, low volatility and flexibility, as well as their potential use in coatings, adhesives and textile water-repellent applications.

3. Supporting Different Formulation Requirements

For formulators, the performance of a UV monomer ultimately needs to be evaluated in the complete formulation. Monomers influence system viscosity and also participate in curing, so properties such as adhesion, hardness, flexibility, shrinkage and final film performance need to be considered together.

Requirements also vary across UV inks, UV coatings, UV adhesives, 3D printing and other UV-curing applications. Ink formulations typically focus on viscosity, wetting and substrate compatibility, while coatings for plastics and metals need to balance adhesion, hardness and flexibility. Adhesive formulations also require consideration of bonding performance, shrinkage and mechanical properties after curing.

Huajinda continues to test its products under practical application conditions, providing technical references for customers during product selection and formulation development.

4. The Event Has Ended, but the Conversation Continues

During RadTech China 2026, the Huajinda team discussed UV monomer selection, product performance, formulation requirements and application development with customers and industry partners. Feedback from downstream applications will continue to provide valuable direction for our product testing and application work.

We thank all customers, technical experts and industry partners who met with Huajinda during the event.

Although RadTech China 2026 has concluded, our work on specialty UV monomers and UV-curing applications continues. We look forward to supporting more customers as they evaluate and apply these products in their formulations.

Meet Huajinda at Upcoming Exhibitions

We look forward to meeting more customers and industry partners at upcoming exhibitions. Follow Huajinda for updates on our specialty chemicals, UV monomers, applications, and upcoming events.

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